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Silicon nitride membranes from CleanSiN are manufactured with the state-of-the-art process. They are very ideal for observing Micro and Nano samples by X-ray microscopy and X-ray spectroscopy techniques. silicon nitride membranes with low stress (<250 MPa) have the advantages of robust, flat and uniform membrane and high X- ray transmission rate which are necessary for experiments with high temperature (~1000℃) and various pressure. CleanSiN is now offering best silicon nitride membranes with 5mm, 7.5mm and 100mm square and 200um frame thickness.
CleanSiN silicon nitride membranes special for TEM are made with advanced MEMS technology. Our products are widely used in material, biological and other researches. Our standard TEM silicon nitride membranes are 3mm sized octagon shaped and fit for all TEM sample holders. Our silicon nitride membranes are applied with low stress technology (<250 MPa) which strengthen the membrane and not easy to break.
When your research requires specialized, reliable, high-quality silicon nitride membranes, turn to our service to enable and support your research. Our MEMS technical staffs have more than 10 years experience and are able to provide wide range of custom service capabilities. Just one call to discover custom service can make for your research.
CleanSiN silicon nitride membranes special for TEM are made with advanced MEMS technology. Our products are widely used in material, biological and other researches. Our standard TEM silicon nitride membranes are 3mm sized octagon shaped and fit for all TEM sample holders. Our window Grids are applied with low stress technology (<250 MPa) which strengthen the membrane and not easy to break.
Lin Zhang, Baojun Lin, Bo Hu, Xianbin Xu, and Wei Ma
Advance Material丨 Volume 30, Issue 22
徐挺 王嘉星 梁瑜章
发明专利 丨 申请号201710101902.8