Selecting the optimal electron microscopy (EM) grid for your research depends on multiple factors, including sample properties, research objectives, and the sample preparation techniques employed. Below is a detailed guide to help you determine the most suitable grid type for different scenarios.

In transmission electron microscopy (TEM), samples must be placed in a high-vacuum environment and withstand intense electron beam bombardment. Since most samples (e.g., biological macromolecules, nanomaterials, thin-film cross-sections) cannot stably exist in a vacuum chamber on their own, EM grids (Electron Microscopy Grids) serve as the critical support structure. They secure the sample, maintain structural stability, and ensure electron beam penetration for imaging. This article systematically introduces the common types, materials, structures, and typical applications of EM grids.

In today's rapidly advancing optical technology landscape—from high-efficiency solar cells to precision photonic chips, from everyday optical lenses to cutting-edge quantum communication—the performance of materials often determines the upper limit of device capabilities. Among these, silicon nitride (Si₃N₄)thin films have emerged as a key material in the optical domain, serving not only as a light controller but also as a guardian for devices and a foundation for integrated optics. This article explores how this versatile player plays a central role in diverse optical applications.

Transmission electron microscopy (TEM) silicon nitride (Si₃N₄) thin-film windows are indispensable tools for nanoscale characterization, providing a stable TEM observation environment for liquid, gas, or soft-matter samples while protecting them from electron-beam damage and contamination. This article analyzes their specific application scenarios and technical advantages in detail.

In this study, silicon nitride thin films(developed by YW MEMS (Suzhou) Co., Ltd.) were employed as TEM supportsfor characterization. The catalyst powder was dispersed in anhydrous ethanol to form an ink, which was then drop-cast onto the silicon nitride film for TEM, STEM, and EDS analysis.Construction of a Strongly Coupled Heterostructure for Enhanced Catalysis

Silicon nitride (SiₓNᵧ)thin films play a critical window role in semiconductor manufacturingand analysis, leveraging their unique physical and chemical properties—including high compactness, excellent chemical stability, favorable optical performance, and process compatibility—to enable isolation, protection, signal transmission, or analysis observation. Below is a detailed breakdown of their core roles across both domains: