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TEM silicon nitride membrane

Single window and window array TEM silicon nitride membrane are mainly used as a support film for TEM (transmission electron microscopy) sample holder to achieve high-resolution characterization of biological or material samples under electron microscope. It can also be used as a supporter for biological cells in TEM (transmission electron microscope), SEM (scanning electron microscope), AFM (atomic force microscope), Raman spectrometer and XRD (X-ray diffraction) equipment. 

Micro porous windows are manufactured by advanced MEMS process, which enables substrate-free observation of nano tubes, 2D materials and other nano-samples. Compared with micro grid carbon films, micro porous silicon nitride membrane has cleaner surface and more uniform micro porosity, which is very suitable for high-resolution characterization of biological or material samples.

Product Features
Silicon nitride membrane is produced in the ultra-clean room using chemical vapor deposition, photoetching, reactive ion etching and other processes in the semiconductor process. Mature semiconductor technology and ultra-clean environment during processing, make the silicon nitride membrane has incomparable performance advantages over other supporting films:
  • High electron beam transmittance

    the minimum film thickness can be up to 10nm, silicon nitride membrane material absorbs less electron beam;

  • Ultra-flat surface

    surface roughness <0.5nm, refocusing frequency can be reduced when the window is scaned in a large area;

  • Temperature resistance

    can withstand the highest temperature of 1000℃;

  • Good chemical stability

    the film is resistant to acid and alkali corrosion; under the action of electron beam, it is resistant to most chemicals;

  • Wide range of applications

    no other structure in the membrane, Cu avoidance and C avoidance observation can be achieved;

  • High quality assurance

    piece-by-piece inspection under light microscopy, strictly control the quality;

  • PRODUCT PARAMETERS
    Micro porous silicon nitride membrane:
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    Window array silicon nitride membrane:
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    Single window silicon nitride membrane:
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    SILICON NITRIDE MEMBRANE STRUCTURE DIAGRAM AND PARAMETER
    • Frame
    • Parameter
    • Frame
    • Parameter
    • Material
    • N/P type silicon
    • Resistivity
    • 1~10Ω*cm
    • Silicon nitride
    • Parameter
    • Silicon nitride
    • Parameter
    • Material
    • LPCVD silicon nitride
    • Stress
    • <250MPa
    • Dielectric constant
    • 6-7
    • Dielectric strength
    • 10(106V/cm)
    • Resistivity
    • 1016Ω*cm
    • Roughness(Ra)
    • 0.28±5%nm
    • Refractive index@630nm
    • 270GPa
    • Roughness(Rms)
    • 0.40±5%nm
    case show
  • As biology and cell carrier

    As biology and cell carrier

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  • Carbonic sample analysis

    Carbonic sample analysis (Photoresist, polymers, food, oil, fuel etc.

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  • Characterization experiments

    Characterization experiments of colloids, aerogels, organic materials and nanoparticles.

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