Silicon nitride (Si₃N₄) membrane windows are widely used in semiconductors, electron microscopy, MEMS, optics, and new energy applications due to their excellent mechanical strength, chemical stability, and optical transparency (particularly in UV to near-infrared wavelengths).

A TEM grid (Transmission Electron Microscope grid) is a core component used to support samples in TEM imaging. It is typically a circular metal disc with a standard diameter of 3.05 mm, featuring a micron-scale array of holes (e.g., square, round, or polygonal) that hold nanoscale samples (such as thin films, nanoparticles, or biological sections). Its primary function is to provide mechanical support while allowing the electron beam to pass through both the sample and the grid's open areas, enabling high-resolution transmission electron imaging.

Silicon nitride (Si₃N₄) thin film windows are widely used in semiconductors, optical devices, MEMS, and biomedical fields due to their excellent mechanical properties, optical performance, and chemical stability. With the rapid development of high-tech industries, the market demand for silicon nitride thin film windows continues to grow. This article provides an in-depth analysis of the driving factors, major application areas, market dynamics, and future development trends, offering valuable insights for industry professionals.

Silicon nitride (Si₃N₄) membrane windows, with their high transmittance, heat resistance, and corrosion stability, have become critical components in synchrotron radiation, TEM, and MEMS devices36. This article provides evidence-based maintenance strategies to extend service life by over 30%.

Silicon nitride (Si₃N₄) thin films exhibit unique physical and chemical properties, making them highly advantageous for various optical applications. Below are several detailed case studies:

Silicon nitride (Si₃N₄) is a material with immense potential, widely used in semiconductor, optical, MEMS (Micro-Electromechanical Systems), and high-temperature/high-frequency applications. As a critical inorganic ceramic material, silicon nitride thin films possess excellent mechanical strength, chemical stability, and high-temperature resistance, making them irreplaceable in many high-precision, high-performance devices.